Semiconductor Manufacturing Equipment
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Based on aggregated insights from structured factory profiles within the CNFX directory, the standard Plasma Source used in the Computer, Electronic and Optical Product Manufacturing sector typically supports operational capacities ranging from standard industrial configurations to heavy-duty production requirements.
A canonical Plasma Source is characterized by the integration of RF Matching Network and Electrode. In industrial production environments, manufacturers listed on CNFX commonly emphasize Quartz construction to support stable, high-cycle operation across diverse manufacturing scenarios.
A device that generates and controls plasma for semiconductor processing applications
Technical details and manufacturing context for Plasma Source
Commonly used trade names and technical identifiers for Plasma Source.
This component is essential for the following industrial systems and equipment:
| pressure: | 1 mTorr - 10 Torr |
| flow rate: | 10-1000 sccm |
| frequency: | 13.56 MHz or 2.45 GHz |
| power range: | 100-5000 W |
| temperature: | 20-400°C |
Manufacturer profiles with relevant production capability in China
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Constructed with quartz, aluminum, stainless steel, and ceramics to withstand high-temperature plasma environments and ensure long-term reliability in semiconductor processing.
The RF matching network optimizes power delivery to the plasma, ensuring consistent ionization and stable processing conditions critical for semiconductor manufacturing precision.
An integrated cooling system maintains optimal operating temperatures, preventing overheating and ensuring consistent plasma performance during extended semiconductor processing cycles.
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